Collaborations

Collaborations from 2018

• Industrial:

  • H. Marques Salvador, Canon, Venlo (The Netherlands).
  • M. Ramezani, TeraNova, Eindhoven (The Netherlands).
  • T. López, Lumileds, Aachen (Germany).
  • M. Verschuuren, SCIL Nanoimprint Solutions, Eindhoven (The Netherlands).
  • J. Vrehen and C. Hoelen, Signify, Eindhoven (The Netherlands)
  • J. de Wit, F. Zijp, ASML, Veldhoven (The Netherlands)
  • T. G. Tiecke and  T. Peyronel. Facebook Inc. (USA).
  • D. de Boer, Signify, Eindhoven (The Netherlands).
  • B. Sciacca and A. Boersman, TNO Innovation for Life, Eindhoven (The Netherlands).

• Academic:

  • L. Andreani, University of Pavia (Italy).
  • D. Abujetas and J.A. Sánchez-Gil, CSIC, Madrid (Spain).
  • S. Murai, University of Kyoto, Kyoto (Japan).
  • R. H. Tichauer, I. Sokolovskii, G. Groenhof, University of Jyväskylä (Finland).
  • F.J. Garcia Vidal and J. Feist, Universidad Autonoma de Madrid (Spain).
  • A. Baldi, R.F. Hamans, and M. Parente, DIFFER (The Netherlands).
  • A.G. Curto, T. V. Raziman, R.H. Godiksen, TU/e (The Netherlands).
  • R.M. Hjelmgart-Godiksen, R. Thottungal Valapu and A.G. Curto, Photonic and  Semiconductor Nanophysics, Eindhoven University of Technology (The Netherlands).
  • F.J. Garcia Vidal and J. Feist, Universidad Autonoma de Madrid (Spain).
  • M. De Giorgi and D. Sanvitto, Advanced Photonics Lab CNR, Lecce (Italy)
  • B. Maes and F. Vaianella, University of Mons (Belgium).
  • K. Arts, R. Vervuurt, and A.A. Bol, Plasma and Materials Processing, Eindhoven University of Technology.
  • W. Wang and T. Odom, Northwestern University (USA).
  • A.I. Väkeväinen and P. Törma, Aalto University (Finland).
  • C. Cochard and T. Granzow, Luxembourg Institute of Science and Technology (Luxemburg).
    
  • M. Escriba-Gelonch and V. Hessel, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology (The Netherlands).