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Collaborations from 2018
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Industrial:
- H. Marques Salvador, Canon, Venlo (The Netherlands).
- M. Ramezani, TeraNova, Eindhoven (The Netherlands).
- T. López, Lumileds, Aachen (Germany).
- M. Verschuuren, SCIL Nanoimprint Solutions, Eindhoven (The Netherlands).
- J. Vrehen and C. Hoelen, Signify, Eindhoven (The Netherlands)
- J. de Wit, F. Zijp, ASML, Veldhoven (The Netherlands)
- T. G. Tiecke and T. Peyronel. Facebook Inc. (USA).
- D. de Boer, Signify, Eindhoven (The Netherlands).
- B. Sciacca and A. Boersman, TNO Innovation for Life, Eindhoven (The Netherlands).
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Academic:
- L. Andreani, University of Pavia (Italy).
- D. Abujetas and J.A. Sánchez-Gil, CSIC, Madrid (Spain).
- S. Murai, University of Kyoto, Kyoto (Japan).
- R. H. Tichauer, I. Sokolovskii, G. Groenhof, University of Jyväskylä (Finland).
- F.J. Garcia Vidal and J. Feist, Universidad Autonoma de Madrid (Spain).
- A. Baldi, R.F. Hamans, and M. Parente, DIFFER (The Netherlands).
- A.G. Curto, T. V. Raziman, R.H. Godiksen, TU/e (The Netherlands).
- R.M. Hjelmgart-Godiksen, R. Thottungal Valapu and A.G. Curto, Photonic and Semiconductor Nanophysics, Eindhoven University of Technology (The Netherlands).
- F.J. Garcia Vidal and J. Feist, Universidad Autonoma de Madrid (Spain).
- M. De Giorgi and D. Sanvitto, Advanced Photonics Lab CNR, Lecce (Italy)
- B. Maes and F. Vaianella, University of Mons (Belgium).
- K. Arts, R. Vervuurt, and A.A. Bol, Plasma and Materials Processing, Eindhoven University of Technology.
- W. Wang and T. Odom, Northwestern University (USA).
- A.I. Väkeväinen and P. Törma, Aalto University (Finland).
- C. Cochard and T. Granzow, Luxembourg Institute of Science and Technology (Luxemburg).
- M. Escriba-Gelonch and V. Hessel, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology (The Netherlands).